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Writer's pictureJulissa Green

Silver Sputtering Target Price 06.13.19

Silver Sputtering Target

Silver, also called argentum, is a chemical element originated from the Anglo-Saxon name siolfur (argentum in Latin). It was early used before 5000 BC. “Ag” is the canonical chemical symbol of silver. Its atomic number in the periodic table of elements is 47 with location at Period 5 and Group 11, belonging to the d-block. The relative atomic mass of silver is 107.8682(2) Dalton, the number in the brackets indicating the uncertainty.


Silver is a soft, white, lustrous transition metal which exhibits the highest electrical conductivity, thermal conductivity, and reflectivity of any metal. Silver sputtering target is used as decorative coatings and antibiotic coating in medical devices.

Silver Sputtering Target Price


Material Size Purity Price

Silver 1.00" Dia. x 0.125" Thick 99.99% $220.00

Silver 1.00" Dia. x 0.250" Thick 99.99% $240.00

Silver 2.00" Dia. x 0.125" Thick 99.99% $235.00

Silver 2.00" Dia. x 0.250" Thick 99.99% $317.00

Silver 2.00" Dia. x 0.250" Thick 99.99% P.O.R.

Silver 2.00" Dia. x 0.250" Thick 99.99% $429.00

Silver 3.00" Dia. x 0.125" Thick 99.99% $332.00

Silver 3.00" Dia. x 0.250" Thick 99.99% $480.00

Silver 3.00" Dia. x 0.250" Thick 99.99% $607.00

Silver 4.00" Dia. x 0.125" Thick 99.99% P.O.R.

Silver 4.00" Dia. x 0.250" Thick 99.99% P.O.R.

Silver 6.00" Dia. x 0.250" Thick 99.99% P.O.R.

Silver 8.00" Dia. x 0.250" Thick 99.99% P.O.R.

Silver Sputtering Target Manufacturer


ISO 9001:2000 certified manufacturer of PVD coating materials including a wide array of sputtering targets. Evaporation materials, porous metal beading coating & thermal spraying materials are also available.


Manufacturer of sputtering targets for the electronics, lighting, medical defense, and energy industries. Offers tantalum, hafnium, niobium, titanium, and tungsten types. Available in various purities, dimensions, and shapes. ROHS and EICC compliant.


The Silver sputter targets from Stanford Advanced Materials are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.


Custom manufacturer of sputtering targets. Various materials include germanium, iridium, nickel, platinum, rhodium, ruthenium, tin, aluminum, titanium, copper, molybdenum, niobium, tantalum, alloys, silicide ceramic, fluoride ceramic and nitride ceramic. Suitable for electronics and semiconductor, displays, glass, photovoltaic, solar thermal and other applications.


Manufacturer of standard and custom metal and alloy products including targets, sputtering targets and copper and antimony sputtering targets. Sputtering targets are also available in alloys of different metals including aluminum, lithium, gold, beryllium, silver, tin, zinc, platinum, silver, barium, calcium, chromium, copper, lanthanide, iron, magnesium, molybdenum, nickel, rhenium, ruthenium, titanium and tungsten. Sputtering targets are arc-casted in vacuum-arc melters using an inert-gas atmosphere and cold-copper crucibles. Oxide targets are hot pressed.




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